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Analysis of 3-panel and 4-panel microscale ionization sources

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dc.contributor.author Natarajan, Srividya en_US
dc.contributor.author Parker, Charles en_US
dc.contributor.author Stoner, Brian en_US
dc.contributor.author Glass, Jeffrey en_US
dc.date.accessioned 2011-04-15T16:46:53Z
dc.date.available 2011-04-15T16:46:53Z
dc.date.issued 2010 en_US
dc.identifier.citation Natarajan,Srividya;Parker,Charles B.;Piascik,Jeffrey R.;Gilchrist,Kristin H.;Stoner,Brian R.;Glass,Jeffrey T.. 2010. Analysis of 3-panel and 4-panel microscale ionization sources. Journal of Applied Physics 107(12): 124508-124508. en_US
dc.identifier.issn 0021-8979 en_US
dc.identifier.uri http://hdl.handle.net/10161/3384
dc.description.abstract Two designs of a microscale electron ionization (EI) source are analyzed herein: a 3-panel design and a 4-panel design. Devices were fabricated using microelectromechanical systems technology. Field emission from carbon nanotube provided the electrons for the EI source. Ion currents were measured for helium, nitrogen, and xenon at pressures ranging from 10(-4) to 0.1 Torr. A comparison of the performance of both designs is presented. The 4-panel microion source showed a 10X improvement in performance compared to the 3-panel device. An analysis of the various factors affecting the performance of the microion sources is also presented. SIMION, an electron and ion optics software, was coupled with experimental measurements to analyze the ion current results. The electron current contributing to ionization and the ion collection efficiency are believed to be the primary factors responsible for the higher efficiency of the 4-panel microion source. Other improvements in device design that could lead to higher ion source efficiency in the future are also discussed. These microscale ion sources are expected to find application as stand alone ion sources as well as in miniature mass spectrometers. (C) 2010 American Institute of Physics. [doi:10.1063/1.3429220] en_US
dc.language.iso en_US en_US
dc.publisher AMER INST PHYSICS en_US
dc.relation.isversionof doi:10.1063/1.3429220 en_US
dc.subject chemical-vapor-deposition en_US
dc.subject nanotube field emitters en_US
dc.subject mass-spectrometer en_US
dc.subject carbon nanotubes en_US
dc.subject electron-impact en_US
dc.subject gases en_US
dc.subject mems en_US
dc.subject physics, applied en_US
dc.title Analysis of 3-panel and 4-panel microscale ionization sources en_US
dc.type Article en_US
dc.description.version Version of Record en_US
duke.date.pubdate 2010-6-15 en_US
duke.description.endpage 124508 en_US
duke.description.issue 12 en_US
duke.description.startpage 124508 en_US
duke.description.volume 107 en_US
dc.relation.journal Journal of Applied Physics en_US

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