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dc.contributor.advisor Clark, Robert L en_US
dc.contributor.author Johannes, Matthew Steven en_US
dc.date.accessioned 2007-08-21T21:21:09Z
dc.date.available 2007-08-21T21:21:09Z
dc.date.issued 2007-07-02 en_US
dc.identifier.uri http://hdl.handle.net/10161/378
dc.description Dissertation en_US
dc.description.abstract This research delineates the design of a nanolithographic process for nanometer scale surface patterning. The process involves the combination of serial atomic force microscope (AFM) based nanolithography with the parallel patterning capabilities of soft lithography. The union of these two techniques provides for a unique approach to nanoscale patterning that establishes a research knowledge base and tools for future research and prototyping.To successfully design this process a number of separate research investigations were undertaken. A custom 3-axis AFM with feedback control on three positioning axes of nanometer precision was designed in order to execute nanolithographic research. This AFM system integrates a computer aided design/computer aided manufacturing (CAD/CAM) environment to allow for the direct synthesis of nanostructures and patterns using a virtual design interface. This AFM instrument was leveraged primarily to study anodization nanolithography (ANL), a nanoscale patterning technique used to generate local surface oxide layers on metals and semiconductors. Defining research focused on the automated generation of complex oxide nanoscale patterns as directed by CAD/CAM design as well as the implementation of tip-sample current feedback control during ANL to increase oxide uniformity. Concurrently, research was conducted concerning soft lithography, primarily in microcontact printing (µCP), and pertinent experimental and analytic techniques and procedures were investigated.Due to the masking abilities of the resulting oxide patterns from ANL, the results of AFM based patterning experiments are coupled with micromachining techniques to create higher aspect ratio structures at the nanoscale. These relief structures are used as master pattern molds for polymeric stamp formation to reproduce the original in a parallel fashion using µCP stamp formation and patterning. This new method of master fabrication provides for a useful alternative to conventional techniques for soft lithographic stamp formation and patterning. en_US
dc.format.extent 10609049 bytes
dc.format.mimetype application/pdf
dc.language.iso en_US
dc.subject Engineering, Mechanical en_US
dc.subject Engineering, Materials Science en_US
dc.subject Atomic force microscope en_US
dc.subject Soft Lithography en_US
dc.subject Anodization en_US
dc.subject Microcontact Printing en_US
dc.subject Nanolithography en_US
dc.subject Nanotechnology en_US
dc.title The Design Of A Nanolithographic Process en_US
dc.type Dissertation en_US
dc.department Mechanical Engineering and Materials Science en_US

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