Electron microscopic characterization of diamond films grown on Si by bias-controlled chemical vapor deposition
Abstract
Diamond films grown by Bias-Controlled Hot Filament Chemical Vapor Deposition (BCCVD)
on silicon (Si) substrates were characterized by Transmission Electron Microscopy
(TEM). Both plan-view and cross-sectional TEM samples were made from diamond films
grown under different biasing conditions. It was found that defect densities in the
films were substantially reduced under zero and reverse bias (substrate negative relative
to the filament) as compared to forward bias. Furthermore, the diamond/Si interface
of the reverse and zero bias films consisted of a single thin interfacial layer whereas
multiple interfacial layers existed at the diamond/Si interface of films grown under
forward (positive) bias. Tungsten (W) contamination was also found in the interfacial
layers of forward bias films. It is concluded that forward biasing in the present
condition is not favorable for growing high quality, low defect density, diamond films.
The possible mechanisms which induced the microstructural differences under different
biasing conditions are discussed. © 1990, Materials Research Society. All rights reserved.
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https://hdl.handle.net/10161/10323Published Version (Please cite this version)
10.1557/JMR.1990.2367Publication Info
Ma, GHM; Lee, YH; & Glass, JT (1990). Electron microscopic characterization of diamond films grown on Si by bias-controlled
chemical vapor deposition. Journal of Materials Research, 5(11). pp. 2367-2377. 10.1557/JMR.1990.2367. Retrieved from https://hdl.handle.net/10161/10323.This is constructed from limited available data and may be imprecise. To cite this
article, please review & use the official citation provided by the journal.
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Show full item recordScholars@Duke
Jeffrey Glass
Professor of Electrical and Computer Engineering
Jeffrey T. Glass is a Professor in the Department of Electrical and Computer Engineering
and Director of the Institute for Enterprise Engineering. He holds the Hogg Family
endowed chair in Engineering Management and Entrepreneurship. Formerly, he was the
Co-Director of The Institute for the Integration of Management and Engineering at
Case Western Reserve University (CWRU) and held the Joseph F. Toot, Jr. endowed chair
in the Case School of Engineering. Prior to these university appointment

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