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Electron microscopic characterization of diamond films grown on Si by bias-controlled chemical vapor deposition

dc.contributor.author Ma, GHM
dc.contributor.author Lee, YH
dc.contributor.author Glass, JT
dc.date.accessioned 2015-07-27T18:32:19Z
dc.date.accessioned 2015-07-27T20:00:43Z
dc.date.issued 1990-01-01
dc.identifier.issn 0884-2914
dc.identifier.uri https://hdl.handle.net/10161/10323
dc.description.abstract Diamond films grown by Bias-Controlled Hot Filament Chemical Vapor Deposition (BCCVD) on silicon (Si) substrates were characterized by Transmission Electron Microscopy (TEM). Both plan-view and cross-sectional TEM samples were made from diamond films grown under different biasing conditions. It was found that defect densities in the films were substantially reduced under zero and reverse bias (substrate negative relative to the filament) as compared to forward bias. Furthermore, the diamond/Si interface of the reverse and zero bias films consisted of a single thin interfacial layer whereas multiple interfacial layers existed at the diamond/Si interface of films grown under forward (positive) bias. Tungsten (W) contamination was also found in the interfacial layers of forward bias films. It is concluded that forward biasing in the present condition is not favorable for growing high quality, low defect density, diamond films. The possible mechanisms which induced the microstructural differences under different biasing conditions are discussed. © 1990, Materials Research Society. All rights reserved.
dc.relation.ispartof Journal of Materials Research
dc.relation.isversionof 10.1557/JMR.1990.2367
dc.relation.replaces http://hdl.handle.net/10161/10322
dc.relation.replaces 10161/10322
dc.title Electron microscopic characterization of diamond films grown on Si by bias-controlled chemical vapor deposition
dc.type Journal article
pubs.begin-page 2367
pubs.end-page 2377
pubs.issue 11
pubs.organisational-group Duke
pubs.organisational-group Duke Science & Society
pubs.organisational-group Electrical and Computer Engineering
pubs.organisational-group Initiatives
pubs.organisational-group Institutes and Provost's Academic Units
pubs.organisational-group Pratt School of Engineering
pubs.publication-status Published
pubs.volume 5
dc.identifier.eissn 2044-5326


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