dc.contributor.advisor |
Laursen, Tod A |
|
dc.contributor.author |
Gajendran, Harishanker |
|
dc.date.accessioned |
2010-05-13T17:55:40Z |
|
dc.date.available |
2011-07-26T04:30:04Z |
|
dc.date.issued |
2010 |
|
dc.identifier.uri |
https://hdl.handle.net/10161/2511 |
|
dc.description.abstract |
<p>Due to the increasing cost of the enhancement techniques in current projection
lithographic techniques and the required time in developing new technology's</p>
<p>as feasible manufacturing technology, EUVL is considered as the leading candidate
for production of 45 nm node and less. In EUVL, mask is held electrostatically against
chuck. This electrostatic chucking process affects the nonflatness of the mask due
to contact interaction and the voltage force between the mask and chuck. A fundamental
understanding of chucking phenomenon is required to realize the SEMI P37 and SEMI
P40 stringent flatness requirements. </p>
<p>The primary challenge is to understand and characterize the ability of electrostatic
chucking phenomenon to acheive consistent and reliable shapes of chucked masks. </p>
<p>The objective of this thesis is to study the effect of initial nonflatness of mask
and chuck, chucking voltage, chuck and mask dimension and gravity on the final nonflatness
of the mask A finite element model of the mask and chuck with initial nonflat surface
is developed. To predict the final nonflatness of the mask frontside with nm accuracy,
the contact interaction between mask and chuck is modeled using van der Waals forces.
These results are compared with penalty method for the runtime and accuracy of results</p>
|
|
dc.format.extent |
1965339 bytes |
|
dc.format.mimetype |
application/pdf |
|
dc.language.iso |
en_US |
|
dc.subject |
Engineering, Mechanical |
|
dc.subject |
Engineering, Civil |
|
dc.subject |
Engineering, Electronics and Electrical |
|
dc.subject |
Contact Mechanics |
|
dc.subject |
EUVL |
|
dc.subject |
Finite element |
|
dc.subject |
mask chuck |
|
dc.title |
Effect of van der Waals forces on Retilce Nonflatness in Extreme Ultraviolet Lithography |
|
dc.type |
Master's thesis |
|
dc.department |
Civil and Environmental Engineering |
|
duke.embargo.months |
6 |
|
dc.date.accessible |
2010-05-18T05:00:38Z |
|