Nanofabrication at high throughput and low cost.
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The task of nanofabrication can, in principle, be divided into two separate tracks: generation and replication of the patterned features. These two tracks are different in terms of characteristics, requirements, and aspects of emphasis. In general, generation of patterns is commonly achieved in a serial fashion using techniques that are typically slow, making this process only practical for making a small number of copies. Only when combined with a rapid duplication technique will fabrication at high-throughput and low-cost become feasible. Nanoskiving is unique in that it can be used for both generation and duplication of patterned nanostructures.
Published Version (Please cite this version)10.1021/nn101472p
Publication InfoWiley, BJ; Qin, D; & Xia, Y (2010). Nanofabrication at high throughput and low cost. ACS Nano, 4(7). pp. 3554-3559. 10.1021/nn101472p. Retrieved from https://hdl.handle.net/10161/4099.
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