Test-pattern selection for screening small-delay defects in very-deep submicrometer integrated circuits
dc.contributor.author | Yilmaz, M | |
dc.contributor.author | Chakrabarty, K | |
dc.contributor.author | Tehranipoor, M | |
dc.date.accessioned | 2009-09-14T13:20:52Z | |
dc.date.issued | 2010-05-01 | |
dc.description.abstract | Timing-related defects are major contributors to test escapes and in-field reliability problems for very-deep submicrometer integrated circuits. Small delay variations induced by crosstalk, process variations, power-supply noise, as well as resistive opens and shorts can potentially cause timing failures in a design, thereby leading to quality and reliability concerns. We present a test-grading technique that uses the method of output deviations for screening small-delay defects (SDDs). A new gate-delay defect probability measure is defined to model delay variations for nanometer technologies. The proposed technique intelligently selects the best set of patterns for SDD detection from an n-detect pattern set generated using timing-unaware automatic test-pattern generation (ATPG). It offers significantly lower computational complexity and excites a larger number of long paths compared to a current generation commercial timing-aware ATPG tool. Our results also show that, for the same pattern count, the selected patterns provide more effective coverage ramp-up than timing-aware ATPG and a recent pattern-selection method for random SDDs potentially caused by resistive shorts, resistive opens, and process variations. © 2010 IEEE. | |
dc.format.mimetype | application/pdf | |
dc.identifier.issn | 0278-0070 | |
dc.identifier.uri | ||
dc.language.iso | en_US | |
dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | |
dc.relation.ispartof | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | |
dc.relation.ispartofseries | ECE-2009-02 | |
dc.relation.isversionof | 10.1109/TCAD.2010.2043591 | |
dc.title | Test-pattern selection for screening small-delay defects in very-deep submicrometer integrated circuits | |
dc.type | Journal article | |
pubs.begin-page | 760 | |
pubs.end-page | 773 | |
pubs.issue | 5 | |
pubs.organisational-group | Duke | |
pubs.organisational-group | Electrical and Computer Engineering | |
pubs.organisational-group | Pratt School of Engineering | |
pubs.publication-status | Published | |
pubs.volume | 29 |
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